Semiconductor Processing
A tantárgyleírás hatályossága
| Subject name (Hungarian, English) |
Félvezető technológia
Semiconductor Processing
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| Subject code | BMEVIEEAC02 | ||||||||||||
| Subject type | — | ||||||||||||
| Training Level | — | ||||||||||||
| Course types and hours (weekly/semester) |
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| Assessment type | vizsga | ||||||||||||
| Credits | 4 | ||||||||||||
| Subject coordinator |
Plesz Balázs
position: egyetemi docens
contact:
plesz.balazs@vik.bme.hu
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| Responsible department |
Elektronikus Eszközök Tanszéke
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| Faculty | Villamosmérnöki és Informatikai Kar | ||||||||||||
| Subject website | — | ||||||||||||
| Primary curriculum type | — | ||||||||||||
| Direct prerequisites – Strong prerequisite | none | ||||||||||||
| Direct prerequisites – Weak prerequisite | none | ||||||||||||
| Direct prerequisites – Parallel prerequisite | none | ||||||||||||
| Direct prerequisites – Milestone prerequisite | none | ||||||||||||
| Direct prerequisites – Exclusion | none |
Objectives
Lecture topics:
Week 1
Introduction, short overview: from quartz to microprocessor. Overview of bipolar monolithic processing steps.
Practice: Doping, resistivity, potentials in various structures realized using semiconductor processing steps.
Week 2
Variety of devices and circuits realized with semiconductor processing technologies
Practice: Orders of magnitude, concentration and sizes-relations in monolithic IC technology
Week 3
Overview of monolithic MOS IC technology, CMOS and BiCMOS circuits.
Discrete bipolar and MOS devices, power devices, IGBT.
Week 4
Manufacturing and characterization of monocrystalline Si (the raw material of IC manufacturing).
Analog and digital integrated circuits.
Week 5
Silicon dioxide (SiO2): properties, processing steps and its importance in semiconductor processing. Characterization of the SiO2 and C-V methods.
Pratice: Evaluation of C-V curves (calculation of doping, surface and interface properties from the C-V curves and p-n junctions and MOS curves).
Week 6
Doping of Si: diffusion. Mathematical models of diffusion.
Practice: Modelling random walk (diffusion) with transition-probability matrix.
Week 7
Doping of Si: ion implantation.
Processors (catalogue IC, ASIC and FPGA circuits).
Week 8
Doping of Si: ion implantation (continued).
Memories (ROM, PROM, EPROM, SRAM, DRAM)
Week 9
Deposition processes: evaporation and sputtering.
CVD processes and epitaxy.
Week 10
Wet and dry chemical etching processes.
Plasma technologies.
Week 11
Metallization and forming of wiring network. Metal-semiconductor contacts. Damascene technology. Assembly and packaging related processes.
Week 12
Effects and challenges of scale-down on manufacturing processes
Mask/reticle preparation and photolithography in sub-micron structures.
Week 13
Processing technologies of devices of ambient intelligence and smart systems. Sensors and transduction techniques. Self-powered sensors: possibilities of energy harvesting.
Principles of device arrangement in VLSI circuits.
Week 14
Introduction of MEMS. Realization of sensors and actuators.
Practice: IC and MEMS layout and structure evaluation.
The lectures accompanied by classroom practices (2 hours in every second week).
Learning outcomes
Ez a tantárgy a KKK rendeletben meghatározott, következő kompetenciák fejlesztését szolgálja:
Knowledge
No learning outcomes recorded.
Skills
No learning outcomes recorded.
Attitudes
No learning outcomes recorded.
Autonomy and responsibility
No learning outcomes recorded.
Oktatási módszertan
Tanulástámogató anyagok
Online források
Recommended preliminary knowledge for completing the subject
General rules
Assessment methods
In-term assessments
No detailed assessments provided.
Weight of in-term assessments
No weights provided.
Exam-period assessments
No detailed assessments provided.
Weight of exam elements
No weights provided.
Grade calculation
No grade thresholds provided.
Attendance requirements
No attendance requirements provided.
Rules for retake and resubmission
Not provided.
Short description
Not provided.
Detailed description
Not provided.
Recommended courses
Workload to complete the subject
No workload breakdown provided.
Validity of subject requirements
Curriculum placement
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